artículo con referato
"Comparative Analysis of MIS Capacitance Structures With High-k Dielectrics Under Gamma, 16O and p Radiation"
C.P. Quinteros, L.S. Salomone, E. Redin, J.M. Rafi, M. Zabala, A. Faigon, F. Palumbo and F. Campabadal
IEEE Trans. Nucl. Sci. 59(4) (2012) 767-772
Abstract
MIS capacitance structures, with Hafnium Oxide, Alumina and nanolaminate as dielectrics were studied under gamma photons 60Co, 25 MeV oxygen ions and 10 MeV protons radiation using capacitance-voltage (C-V) characterization.
DEPARTAMENTO ENERGIA SOLAR
